Thomas F. Edgar is Professor of Chemical Engineering at the University of Texas at Austin and holds the George T. and Gladys H. Abell Chair in Engineering. He received a B.S. in chemical engineering from the University of Kansas and a Ph.D. from Princeton University. For over 40 years, his academic work has been concentrated in process modeling, control, and optimization, with over 300 articles and book chapters. He has coauthored leading textbooks: Optimization of Chemical Processes (McGraw-Hill, 2001) and Process Dynamics and Control (Wiley, 2004). He has received major awards from the AIChE and ASEE and is a member of the National Academy of Engineering. He also served as an ACC General Chair and Program Chair and as AACC President (1990-1991). He has carried out modeling and control research projects jointly with AMD, Applied Materials, Global Foundries, Motorola, Texas Instruments, Tokyo Electron, and SEMATECH, involving 15 Ph.D. students who have worked in the microelectronics industry.
Advances in modeling and control will be required to meet future technical challenges in semiconductor manufacturing. For batch processes such as occur in semiconductor fabrication, modeling and control must be incorporated into a multi-level framework including sequential control, within-the-batch control, run-to-run control, fault detection, and factory control. Implementation challenges include a lack of suitable in situ measurements, variations in process equipment characteristics and wafer properties, limited process understanding, and non-automated operational practices. This presentation reviews how basic research findings in modeling and control have influenced commercial applications in key unit operations such as lithography and plasma etching as well as in overall factory control. The use of simultaneous identification and control algorithms as part of on-line testing is also illustrated.